Messtechnik

Für hochpräzise Messungen stehen uns folgende Anlagen zur Verfügung:

Solarsimulator zur Messung der Hellkennlinie von Einfach- oder Stapelzellen

Manufacturer Wacom
Model
WXS-150S-10
Spectrum AM 1.5 G
Illuminated area 160 mm x 160 mm
Homogeneity < ±2%
Irradiance 70 - 120 mW/cm2
Measurement current Up to 10 A
Measurement temperature 25 °C

EQE-Messplatz zur Messung der Quanteneffizienz oder spektralen Empfindlichkeit an Einfach- und Stapelzellen / CPM-Messplatz zur Bestimmung der Defektdichte in amorphem Silicium

 

Manufacturer Fraunhofer ISE
Lamps Xenon (EQE), Halogen (CPM)
Number of gratings 2/3
Wavelength resolution 0.1 nm
Stray light 3*10-5 at 250 nm
Measurement electronics Digital lock-in amplifiers
Contact system On demand
 
Speclab Messplatz
© Fraunhofer ISE

Shunt-Messplatz

 

Manufacturer Fraunhofer ISE
Sample size Up to 156 mm x 156 mm
Substrate temperature Room temperature
Typical measurement time 1 – 5 sec
Shunt to be detected Edge isolation failure
Cracks
Shunting by metallization
 
Shunt Messplatz
© Fraunhofer ISE

Spektrometer zur Messung von Transmission, Reflexion und Absorption

Manufacturer Varian
Model Cary 500
Spectrometer type
Double monochromator, dual beam system
Wavelength range 175 – 3300 nm
Light Sources Tungsten-halogen (VIS-IR), Deuterium arc (UV)
Built-In detectors Photomultiplier, PbS photoconductor
Maximum spectral resolution 0.1 nm
Integrating sphere (IS) Labsphere with spectralon coating
Wavelength range with IS 250 – 2500 nm
Maximum measurement speed 900 nm/min

Haze-Messplatz

Manufacturer Varian
Model Cary 500
Spectrometer type
Double monochromator, dual beam system
Wavelength range 175 – 3300 nm
Light Sources Tungsten-halogen (VIS-IR), Deuterium arc (UV)
Built-In detectors Photomultiplier, PbS photoconductor
Maximum spectral resolution 0.1 nm
Integrating sphere (IS) Labsphere with spectralon coating
Wavelength range with IS 250 – 2500 nm
Maximum measurement speed 900 nm/min

Degradations-Messplatz

Manufacturer Hönle
Model Sol 2
Intensity
910 W/m2
Illuminated area max. 40 cm x 35 cm
Lamp lifetime 2500 h
Lamp type Metal halogenide

Schichtwiderstand- Messplatz

Manufacturer Fraunhofer ISE
Model FAKIR
Sample size
156 mm x 156 mm
Needle Force 0.4 to 1.3 N per needle
Needle spacing 1.5 mm
Number of measurement points 100 on full area
Measurement speed 2 points/sec
Measurement range 100 mOhm/sq – 100 MOhm/sq
 

Profilometer

Manufacturer Tencor
Model Alpha-Step 500
Sample size
158 mm x 158 mm
Maximum sample thickness 10 mm
Scan method Moving stylus, stationary stage
Scan length 10 mm
Scan speed 2 μm/s to 200 μm/s
Horizontal resolution 0.01 μm
Vertical range ± 6.5 μm at 1 Å resolution
± 150 μm at 25 Å resolution
± 1000 μm at 155 Å resolution
Optical magnification 70 – 120 x

Ellipsometer zur ortsaufgelösten Messung von Brechungsindex und Schichtdicke von dünnen Schichten

Manufacturer Sentech
Model SE 502
Ellipsometer type Rotating analyzer
Wavelength 632.8 nm
Spot diameter 1 mm
Spot diameter with µSpot option 50 µm
Angles of incidence 40 – 70 °, 5 ° steps
Scanning area 150 mm x 150 mm
Wavelength range film thickness probe (FTP 500) 500 – 900 nm
Thickness measurement range 5000 nm

MWPCD-Messplatz

Manufacturer Semilab
Model WT 2000
Measurement range 0.1 μs – 30 ms, resolution 0.1 %
Lateral resolution 0.5 mm – 16 mm
Measurement time 30 ms/point
Resistivity range for sample 0.1 Ωcm – 1000 Ωcm
Bias light 1 sun
Microwave frequency 10.043 GHz to 10.558 GHz
Microwave power > 40 mW
Excitation laser wavelength 905 nm (InGaAs pulsed laser diode)
Output power Up to 16.4 W
Pulse width 200 ns

QSSPC- Messplatz

Manufacturer Sinton Consulting
Model WTC-120
Sample size 40 mm – 210 mm
Measurement range 100 ns – 10 ms
Measurement time 30 ms/point
Sample thickness 10 µm – 2000 µm
Resistivity measurement range 3 Ω/sq – 600 Ω/sq
Light bias range 0 – 50 suns
Option Suns-Voc-150

Leitfähigkeit- Messplatz

Manufacturer Fraunhofer ISE
Sample size Up to 160 mm x 160 mm
Substrate temperature Room temperature to 473 K
Atmosphere Ambient or vacuum
Measurable resistance Up to 200 TΩ
 
sigma-t

CV-Messplatz

Manufacturer Hewlett Packard
Model HP 4284
Sample size Up to 156 mm x 156 mm
Typical size of test structure 1 mm x 1mm
Frequency range 20 Hz to 1 MHz

Forschungsmikroskop

Manufacturer Olympus
Model AX70-RF
Stage movement manual
Maximum sample size 150 mm x 150 mm
Magnification Max. 1000 x
Observation modes Simple polarized light contrast
Phase contrast
Normarski contrast
Picture export Via external camera

Spektralellipsometer

Manufacturer HORIBA
Model UVISEL 2 - UV -NIR
Thickness range 1 nm - 20 µm
Wavelength range 190 - 2100 nm
Minimum spot diameter 34 µm x 34 µm
Angles of incidence 35 - 90 °
Scanning area 200 mm x 200 mm
Measurement on textured silicon substrates yes

EL-Messplatz

Manufacturer University of Applied Science Münster
Sample size Up to 156 mm x 156 mm
Camera system Canon EOS 1100D DSR

LBIC

Manufacturer Semilab
Model Tool für Semilab WT 2000 MWPCD system
Spot size 100 µm
Wavelengths 403, 873, 951, 974 nm
Measurement modes Current, direct reflection, diffuse reflection
Spot diameter with µSpot option 50 µm
Angles of incidence 35 - 90 °
Scanning area 156 mm x 156 mm
Data analysis external and internal quantum efficiency, diffusion length